| 型號： | 定制型 |
|---|---|
| 品牌： | 拓吉泰 |
| 原產地： | 中國 |
| 類別： | 化工 / 無機原料 / 氧化物 |
| 標籤︰ | 純硅靶材 , 真空鍍膜靶材 , 磁控濺射靶材 |
| 單價： |
¥40000
/ 根
|
| 最少訂量： | 1 根 |
| 最後上線︰2022/10/11 |
噴塗硅靶材 Spray Si Target
產品說明Product description
以等離子體為熱源，在真空環境，或負壓氮氣或氬氣保護環境下將Si粉末加熱到熔融或半熔融狀態並高速衝擊背管表面形成緻密塗層，從而制備出高純度、低氧含量、高緻密度Si靶材。
With plasma as the heat source, high purity, low oxygen content, high density Si targets are produced from Si powder. The Si powder is heated to molten or semi-molten state in vacuum or at a negative pressure of nitrogen (N2) or argon (Ar) and deposited on the surface of backing tube at high speed to form dense coatings.
產品特點Products feature
|
項目 Item |
參數 Specifications |
檢測手段 Testing method |
|
純度Purity（Si+B） |
≥ 99.99% |
|
|
密度Density |
≥2.2 g/cm3 |
阿基米德密度儀 Archimedes densimeter |
|
雜質含量Inclusions |
Fe +Al+Ca: ≤50 ppm B: ≤100 ppm O: ≤2000 ppm N: ≤500 ppm 雜質總和(O、N、B除外): ≤100 ppm Total impurity (excluding O, N, B ): ≤100 ppm |
ICP |
|
電阻率 Electrical resistivity |
≤10Ω·cm |
四探針電阻率儀 Four probe resistivity meter |
背管材質 Backing tube
-選用304/316L不鏽鋼（無磁）。
304/316L stainless steel (non-magnetic).
靶材尺寸Dimension
-按照圖紙要求加工
According to customized drawings.
應用領域Applications
-用於製作SiO2/Si3N4膜，主要用於光學玻璃，觸摸屏之AR膜系，Low-E鍍膜玻璃，半導體電子，平面顯示，觸摸屏。
For deposition of SiO2/Si3N4 films, for optical glasses, AR films of touch panel screens, Low-E glasses, semiconductor devices and flat panel screens.
